ISSN - 10637842, EISSN - 10906525, Technical Physics, 2012, vol. 57, p. 1225-1229
Quick ellipsometric technique for determining the thicknesses and optical constant profiles of Fe/SiO 2/Si(100) nanostructures during growth
An algorithm is developed to perform rapid control of the thickness and optical constants of a film structure during growth. This algorithm is tested on Fe/SiO 2/Si(100) structures grown in an Angara molecular-beam epitaxy setup. The film thicknesses determined during their growth are compared with X-ray spectral fluorescence analysis and transmission electron microscopy data. © 2012 Pleiades Publishing, Ltd.